TEOS (Tetraethyl Orthosilicate)
TEOS (Tetraethyl Orthosilicate)
TEOS is a crucial chemical in the semiconductor industry, used for depositing silicon oxide layers during the chemical vapor deposition (CVD) process. We offer high-purity TEOS to ensure that the oxide layers formed on silicon wafers are of the highest quality. Our TEOS is handled using chemically resistant pumps and containment systems to ensure safety and purity during use.
- Purpose: A silicon source in the chemical vapor deposition (CVD) process for forming silicon oxide layers on wafers.
- Properties :
- High purity to ensure contamination-free oxide layers.
- Stored and transported in corrosion-resistant containers.
- Handling
- Requires chemically resistant pumps, tubing, and containment systems.
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