Other Chemicals and Gases
Other Chemicals and Gases
We supply a wide range of essential chemicals and gases for semiconductor manufacturing, including:
- Hydrofluoric Acid (HF): For etching silicon dioxide layers.
- Ammonium Hydroxide and Nitric Acid: For cleaning and preparing wafers.
- Gases like Argon, Nitrogen, Silane, Phosphine, and Diborane are used for deposition, doping, and creating inert environments during processing.
- Chemicals :
- Hydrofluoric Acid (HF): For etching silicon dioxide.
- Ammonium Hydroxide, Nitric Acid: For cleaning wafers.
- Gases :
- Argon and Nitrogen: For inert atmospheres during deposition or etching.
- Silane (SiH₄): For silicon deposition.
- Phosphine and Diborane: For doping wafers with specific properties.
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